Improved thermal stability of antireflective moth-eye topography imprinted on PMMA/TiO2 surface nanocomposites

The thermal stability of antireflective moth-eye topographical features fabricated by nanoimprint lithography on poly (methyl methacrylate) (PMMA) incorporating TiO2nanoparticles is explored. effect nanoparticle load the relaxation dynamics nanostructure evaluated via grazing incidence small angle x-ray scattering measurements byin situmonitoring structural decay nanopatterns upon annealing. It demonstrated that incorporation to imprinted surface nanocomposite films delays greatly pattern which, in turn, enhances patterned topography even at temperatures well above polymer glass transition (Tg). improved behavior will significantly enhance their functionality and performance light-trapping applications where typically rise, such as solar devices or panels.